Cal Nano Services

Coating Targets/Sputter Targets

We specialize in producing high-quality custom sputtering targets, tailored to your specific material and performance requirements. Whether you need a small prototype batch for R&D or a larger production run for commercial applications, we offer flexible manufacturing capabilities to deliver consistent, reliable targets in a wide range of compositions, sizes, and purities.

Our custom sputtering targets are created using Spark Plasma Sintering (SPS), also known as Field-Assisted Sintering Technology (FAST), a cutting-edge technique that offers significant advantages over traditional hot pressing. SPS uses pulsed electric currents and uniaxial pressure to rapidly consolidate powders at lower temperatures and in shorter times. This results in dense, fine-grained materials with improved homogeneity and minimized grain growth, critical for high-performance sputtering targets. Compared to hot pressing, SPS allows for better control of microstructure, reduced processing time, and the ability to sinter difficult or reactive materials with minimal degradation, making it an ideal method for both small-scale prototyping and scalable production of advanced target materials.